Isotopically-enriched boron-containing compounds, and methods of making and using same
US8138071B2 · kind B2 · utility
2Cited by
32References
10Claims
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Key dates
| Filing date | Oct 27, 2010 |
| Grant date | Mar 20, 2012 |
| Priority date | — |
| Expiry date | Dec 3, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31701
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
An isotopically-enriched, boron-containing compound comprising two or more boron atoms and at least one fluorine atom, wherein at least one of the boron atoms contains a desired isotope of boron in a concentration or ratio greater than a natural abundance concentration or ratio thereof. The compound may have a chemical formula of B2F4. Synthesis methods for such compounds, and ion implantation methods using such compounds, are described, as well as storage and dispensing vessels in which the isotopically-enriched, boron-containing compound is advantageously contained for subsequent dispensing use.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.