Lithographic apparatus and device manufacturing method
US8138486B2 · kind B2 · utility
1Cited by
24References
20Claims
0Family size
Assignee
Inventors
- Hans Jansen
- Sebastiaan Maria Johannes Cornelissen
- Sjoerd Nicolaas Lambertus Donders
- Roelof Frederik De Graaf
- Christiaan Alexander Hoogendam
- Hernes Jacobs
- Martinus Hendrikus Antonius Leenders
- Jeroen Johannes Sophia Maria Mertens
- Jan-Gerard Cornelis Van Der Toorn
- Peter Smits
- Franciscus Johannes Joseph Janssen
- Michel Riepen
- Bob Streefkerk
Key dates
| Filing date | Nov 6, 2009 |
| Grant date | Mar 20, 2012 |
| Priority date | — |
| Expiry date | Apr 1, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/707
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.