Steiner tree based approach for polygon fracturing
US8151236B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 19, 2008 |
| Grant date | Apr 3, 2012 |
| Priority date | — |
| Expiry date | Jan 12, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/68
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Roughly described, a method for mask data preparation is described, for use with a preliminary mask layout that includes a starting polygon, the vertices of the starting polygon including I-points (vertices of the starting polygon having an interior angle greater than 90 degrees), including steps of developing a rectilinear partition tree on at least the I-points of the starting polygon, and using the edges of the partition tree to define the partition of the starting polygon into sub-polygons for mask writing.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.