Patent · US Active

Method for measuring the creep of a thin film inserted between two rigid substrates, with one cantilever end

US8152364B2 · kind B2 · utility

2Cited by

11References

12Claims

0Family size

Assignee

COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES · FR

Inventors

Cecile Petitdidier · Beacon, US
Raluca Tiron · Saint-Égrève, FR
Benedicte Mortini · Meylan, FR

Key dates

Filing date	Dec 16, 2008
Grant date	Apr 10, 2012
Priority date	—
Expiry date	Jul 24, 2030

Classification

Technology area (CPC G)Physics
CPC primaryG01N2203/0094
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

A film is inserted between two rigid substrates which form a sample. The sample is fixed at a first end in a device for measuring creep. The device comprises means for applying a predetermined force on a free end of the sample. The film being sheared, study of its creep can be performed.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.