Baffle plate and substrate processing apparatus
US8152925B2 · kind B2 · utility
20Cited by
54References
17Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jun 12, 2009 |
| Grant date | Apr 10, 2012 |
| Priority date | — |
| Expiry date | Oct 20, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32633
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A baffle plate, provided in a processing chamber for processing a substrate therein such that the baffle plate is disposed around a mounting table for mounting the substrate thereon, has a plurality of gas exhaust holes, through which a gas is exhausted from the processing chamber. The baffle plate has a stacked structure including a plurality of plate-shaped members. The baffle plate includes a pressure adjustment gas supply passageway to supply a pressure adjustment gas for adjusting a pressure in the processing chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.