Substrate cleaning method, substrate cleaning system and program storage medium
US8152928B2 · kind B2 · utility
2Cited by
10References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 15, 2007 |
| Grant date | Apr 10, 2012 |
| Priority date | — |
| Expiry date | Sep 10, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67051
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A substrate cleaning method can uniformly removing particles from substrates at a high removing efficiency. The substrate cleaning method includes the steps of immersing substrates W in a cleaning liquid in a cleaning tank 12, and generating ultrasonic waves in the cleaning liquid contained in the cleaning tank. A region in the cleaning tank toward which the cleaning liquid is supplied is varied with respect to a vertical level in the step of generating ultrasonic waves in the cleaning liquid while the cleaning liquid is being supplied into the cleaning tank.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.