Coating and developing system and coating and developing method
US8154106B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 22, 2006 |
| Grant date | Apr 10, 2012 |
| Priority date | — |
| Expiry date | Aug 19, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/0257
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A coating and developing system for forming a resist film on a substrate by coating the substrate with a liquid resist and developing the resist film after the resist film has been processed by immersion exposure that forms a liquid layer on the surface of the substrate is capable of reducing difference in property among resist films formed on substrates.The coating and developing system includes: a cleaning unit for cleaning a surface of a substrate coated with a resist film; a carrying means for taking out the substrate from the cleaning unit and carrying the substrate to an exposure system that carries out an immersion exposure process; and a controller for controlling the carrying means such that a time interval between a wetting time point when the surface of the substrate is wetted with the cleaning liquid by the cleaning unit and a delivery time point when the substrate is delivered to the exposure system is equal to a predetermined set time interval. The set time interval is determined such that the substrate is subjected to the immersion exposure process after contact angle drop rate at which contact angle between the cleaning liquid and a surface of the substrate drops ha…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.