Patent · US Active

Method of making and apparatus having windowless polishing pad and protected fiber

US8157614B2 · kind B2 · utility

6Cited by

12References

21Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Jimin Zhang · San Jose, US
Alain Duboust · Sunnyvale, US
Doyle E. Bennett · Santa Clara, US

Key dates

Filing date	Apr 30, 2009
Grant date	Apr 17, 2012
Priority date	—
Expiry date	Oct 15, 2030

Classification

Technology area (CPC B)Performing Operations; Transporting
CPC primaryB24B49/12
WIPO fieldMachine tools
WIPO sectorMechanical engineering

Abstract

A polishing system includes a polishing pad with an aperture that extends through all layers of the polishing pad and a light transmissive film positioned on top of a light-generating or light-guiding element of an optical monitoring system.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.