Method for constructing OPC model
US8166424B2 · kind B2 · utility
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12Claims
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Key dates
| Filing date | Sep 16, 2008 |
| Grant date | Apr 24, 2012 |
| Priority date | — |
| Expiry date | Feb 26, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/68
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for constructing an optical proximity correction (OPC) model is described. A test pattern is provided, and the test pattern is then written on a mask. The pattern on the mask is measured to obtain a modified pattern. An OPC model is constructed according to the modified pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.