Magnetically enhanced, inductively coupled plasma source for a focused ion beam system
US8168957B2 · kind B2 · utility
30Cited by
23References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 11, 2010 |
| Grant date | May 1, 2012 |
| Priority date | — |
| Expiry date | May 18, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/0815
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The present invention provides an inductively coupled, magnetically enhanced ion beam source, suitable to be used in conjunction with probe-forming optics to produce an ion beam without kinetic energy oscillations induced by the source.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.