Method and system for automatic generation of throughput models for semiconductor tools
US8170704B2 · kind B2 · utility
1Cited by
3References
19Claims
0Family size
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Key dates
| Filing date | Mar 9, 2009 |
| Grant date | May 1, 2012 |
| Priority date | — |
| Expiry date | Aug 2, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG05B17/02
- WIPO fieldControl
- WIPO sectorInstruments
Abstract
The throughput of complex cluster tools of a semiconductor manufacturing environment may be determined for a desired manufacturing scenario on the basis of automatically generated throughput models. The throughput models may be established on the basis of rule messages with high statistical relevance.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.