Lithographic apparatus and device manufacturing method
US8174674B2 · kind B2 · utility
4Cited by
31References
38Claims
0Family size
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Key dates
| Filing date | Sep 9, 2008 |
| Grant date | May 8, 2012 |
| Priority date | — |
| Expiry date | Dec 26, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70341
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An immersion lithography apparatus includes a liquid supply system configured to supply a liquid to a space through which a beam of radiation passes, the liquid having an optical property that can be tuned by a tuner. The space may be located between the projection system and the substrate. The tuner is arranged to adjust one or more properties of the liquid such as the shape, composition, refractive index and/or absorptivity as a function of space and/or time in order to change the imaging performance of the lithography apparatus.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.