Dual beam system
US8183547B2 · kind B2 · utility
3Cited by
40References
20Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | May 27, 2010 |
| Grant date | May 22, 2012 |
| Priority date | — |
| Expiry date | Dec 8, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/30472
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A dual beam system provides for operation of a focused ion beam in the presence of a magnetic field from an ultra-high resolution electron lens. The ion beam is deflected to compensate for the presence of the magnetic field.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.