Hybrid diffraction modeling of diffracting structures
US8195435B2 · kind B2 · utility
2Cited by
2References
10Claims
0Family size
Assignees
Inventor
Key dates
| Filing date | Dec 19, 2008 |
| Grant date | Jun 5, 2012 |
| Priority date | — |
| Expiry date | Nov 6, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B2210/56
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Diffraction modeling of a diffracting structure employing at least two distinct differential equation solution methods. In an embodiment, a rigorous coupled wave (RCW) method and a coordinate transform (C) method are coupled with a same S-matrix algorithm to provide a model profile for a scatterometry measurement of a diffracting structure having unknown parameters. In an embodiment, a rigorous coupled wave (RCW) method and a coordinate transform (C) method generate a modeled angular spectrum of diffracted orders as a prediction for how a diffracting photolithographic mask images onto a substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.