Method and system for depositing a layer from light-induced vaporization of a solid precursor
US8197898B2 · kind B2 · utility
3Cited by
20References
16Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Mar 29, 2005 |
| Grant date | Jun 12, 2012 |
| Priority date | — |
| Expiry date | Sep 11, 2029 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/4405
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method and system for depositing a layer from a vaporized solid precursor. The method includes providing a substrate in a process chamber of a deposition system, forming a precursor vapor by light-induced vaporization of a solid precursor, and exposing the substrate to a process gas containing the precursor vapor to deposit a layer including at least one element from the precursor vapor on the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.