Method of measuring a lithographic projection apparatus
US8208122B2 · kind B2 · utility
7Cited by
16References
26Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 14, 2009 |
| Grant date | Jun 26, 2012 |
| Priority date | — |
| Expiry date | Jul 8, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70641
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of measuring a lithographic projection apparatus is described. The method includes imaging a verification mark of a patterning device onto a radiation-sensitive layer held by a substrate table of a lithographic apparatus, wherein the verification mark includes at least a first, a second and a third verification structure that have a mutually different sensitivity profile for a dose setting, a focus setting and a contrast setting.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.