Patent · US Active

Device for damping vibrations in projection exposure apparatuses for semiconductor lithography

US8212992B2 · kind B2 · utility

1Cited by

2References

14Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Peter Kloesch · Oberkochen, DE
Michael Ringel · Oberkochen, DE
Markus Weiss · Aalen, DE

Key dates

Filing date	Mar 11, 2011
Grant date	Jul 3, 2012
Priority date	—
Expiry date	Mar 11, 2031

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/7085
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A changeable assembly for a projection exposure apparatus for semiconductor lithography contains at least one damping element. Projection exposure apparatus for semiconductor lithography and measuring assemblies for a projection exposure apparatus for semiconductor lithography can include at least one sensor for detecting parameters and vibrations of the projection exposure apparatus, wherein the measuring assembly is embodied in such a way that it can be inserted into an exchange opening, provided for an optical element, in the projection exposure apparatus.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.