Patent · US Active

Plasma reactor with center-fed multiple zone gas distribution for improved uniformity of critical dimension bias

US8236133B2 · kind B2 · utility

11Cited by
1References
9Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 20, 2008
Grant dateAug 7, 2012
Priority date
Expiry dateJun 8, 2031

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J37/32449
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

A gas distribution assembly for the ceiling of a plasma reactor includes a center fed hub and an equal path length distribution gas manifold underlying the center fed hub.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.