Dan Katz
38Patents
13h-index
41Co-inventors
81Inventor score
Filing activity: Oct 19, 1992 → Feb 27, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5429070A | High density plasma deposition and etching apparatus | Electricity | 196 | Expired |
| US5421891A | High density plasma deposition and etching apparatus | Electricity | 99 | Expired |
| US6189484A | Plasma reactor having a helicon wave high density plasma source | Electricity | 77 | Expired |
| US6894245B2 | Merie plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression | Electricity | 70 | Expired |
| US6586886B1 | Gas distribution plate electrode for a plasma reactor | Electricity | 68 | Expired |
| US6471822B1 | Magnetically enhanced inductively coupled plasma reactor with magnetically confined plasma | Electricity | 67 | Expired |
| US7030335B2 | Plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression | Electricity | 53 | Expired |
| US7132618B2 | MERIE plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression | Electricity | 36 | Expired |
| US7645357B2 | Plasma reactor apparatus with a VHF capacitively coupled plasma source of variable frequency | Electricity | 30 | Active |
| US7264688B1 | Plasma reactor apparatus with independent capacitive and toroidal plasma sources | Electricity | 27 | Expired |
| US7436645B2 | Method and apparatus for controlling temperature of a substrate | Electricity | 23 | Active |
| US6676760B2 | Process chamber having multiple gas distributors and method | Chemistry; Metallurgy | 20 | Expired |
| US9275887B2 | Substrate processing with rapid temperature gradient control | Performing Operations; Transporting | 17 | Active |
| US8066895B2 | Method to control uniformity using tri-zone showerhead | Electricity | 13 | Active |
| US7674394B2 | Plasma process for inductively coupling power through a gas distribution plate while adjusting plasma distribution | Electricity | 11 | Active |
| US8236133B2 | Plasma reactor with center-fed multiple zone gas distribution for improved uniformity of critical dimension bias | Electricity | 11 | Active |
| US6677712B2 | Gas distribution plate electrode for a plasma receptor | Electricity | 11 | Expired |
| US9870721B2 | System and method for teaching basic ultrasound skills | Human Necessities | 10 | Active |
| US7780864B2 | Process using combined capacitively and inductively coupled plasma sources for controlling plasma ion radial distribution | Electricity | 10 | Active |
| US11062624B2 | Embedded motion sensing technology for integration within commercial ultrasound probes | Human Necessities | 9 | Active |
| US10380919B2 | System and method for extended spectrum ultrasound training using animate and inanimate training objects | Physics | 9 | Active |
| US7832354B2 | Cathode liner with wafer edge gas injection in a plasma reactor chamber | Electricity | 9 | Active |
| US11315439B2 | System and method for extended spectrum ultrasound training using animate and inanimate training objects | Physics | 8 | Active |
| US10380920B2 | System and method for augmented ultrasound simulation using flexible touch sensitive surfaces | Physics | 8 | Active |
| US11120709B2 | System and method for teaching basic ultrasound skills | Human Necessities | 8 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.