Local multivariable solver for optical proximity correction in lithographic processing method, and device manufactured thereby
US8239786B2 · kind B2 · utility
3Cited by
3References
20Claims
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Key dates
| Filing date | Dec 22, 2009 |
| Grant date | Aug 7, 2012 |
| Priority date | — |
| Expiry date | Sep 17, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/36
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A multivariable solver for proximity correction uses a Jacobian matrix to approximate effects of perturbations of segment locations in successive iterations of a design loop. The problem is formulated as a constrained minimization problem with box, linear equality, and linear inequality constraints. To improve computational efficiency, non-local interactions are ignored, which results in a sparse Jacobian matrix.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.