Been-Der Chen
17Patents
5h-index
18Co-inventors
59Inventor score
Filing activity: Jun 15, 2007 → Oct 23, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7707538B2 | Multivariable solver for optical proximity correction | Physics | 20 | Active |
| US8443312B2 | Method and apparatus for enhancing signal strength for improved generation and placement of model-based sub-resolution assist features (MB-SRAF) | Physics | 12 | Active |
| US9619607B2 | Method and apparatus for cost function based simultaneous OPC and SBAR optimization | Physics | 6 | Active |
| US8812998B2 | Method and apparatus for cost function based simultaneous OPC and SBAR optimization | Physics | 6 | Active |
| US8560979B2 | Local multivariable solver for optical proximity correction in lithographic processing method, and device manufactured thereby | Physics | 6 | Active |
| US11176307B2 | Method and system for pattern configuration | Physics | 4 | Active |
| US8826198B2 | Method and apparatus for enhancing signal strength for improved generation and placement of model-based sub-resolution assist features (MB-SRAF) | Physics | 3 | Active |
| US8938699B2 | Multivariable solver for optical proximity correction | Physics | 3 | Active |
| US8239786B2 | Local multivariable solver for optical proximity correction in lithographic processing method, and device manufactured thereby | Physics | 3 | Active |
| US9418194B2 | Method and apparatus for model based flexible MRC | Physics | 2 | Active |
| US8291352B2 | Multivariable solver for optical proximity correction | Physics | 2 | Active |
| US11232249B2 | Method for determining curvilinear patterns for patterning device | Physics | 2 | Active |
| US8448099B2 | Multivariable solver for optical proximity correction | Physics | 2 | Active |
| US11797748B2 | Method for generating patterning device pattern at patch boundary | Physics | 1 | Active |
| US11734490B2 | Method for determining curvilinear patterns for patterning device | Physics | 0 | Active |
| US12430490B2 | Method for generating patterning device pattern at patch boundary | Physics | 0 | Active |
| US8806389B2 | Method and apparatus for model based flexible MRC | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.