Compositions and processes for photolithography
US8241832B2 · kind B2 · utility
16Cited by
0References
9Claims
0Family size
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Key dates
| Filing date | Dec 31, 2009 |
| Grant date | Aug 14, 2012 |
| Priority date | — |
| Expiry date | Aug 14, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/11
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Topcoat layer compositions are provided that are applied above a photoresist composition. The compositions find particular applicability to immersion lithography processing.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.