Lithographic apparatus and in-line cleaning apparatus
US8243255B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 19, 2008 |
| Grant date | Aug 14, 2012 |
| Priority date | — |
| Expiry date | Apr 1, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/7085
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An immersion type lithographic apparatus includes an immersion system configured to at least partially fill an immersion space with an immersion liquid. The apparatus also includes an indicator configured to indicate whether a part of the immersion system should be cleaned and a cleaning liquid supply system configured to supply a cleaner to the part of the lithographic apparatus. The cleaner is at least one of a plurality of different cleaners. Each cleaner or combination of cleaners is configured to clean a different type and/or level of contamination in the part of the lithographic apparatus. The apparatus also includes a controller configured to control which of the plurality of cleaners is provided to the part of the lithographic apparatus, based on an indication received from the indicator.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.