Patent · US Active

Enhanced OVL dummy field enabling “on-the-fly” OVL measurement methods

US8243273B2 · kind B2 · utility

11Cited by
3References
21Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 4, 2009
Grant dateAug 14, 2012
Priority date
Expiry dateAug 18, 2030

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/68
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A semiconductor wafer may include a dummy field configured to enable overlay measurements. The enhanced dummy field may include a plurality of encoding blocs that enable OVL measurements to be made throughout the enhanced dummy field.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.