High-resolution X-ray diffraction measurement with enhanced sensitivity
US8243878B2 · kind B2 · utility
18Cited by
83References
42Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 7, 2010 |
| Grant date | Aug 14, 2012 |
| Priority date | — |
| Expiry date | Nov 25, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N23/207
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method for analysis includes directing a converging beam of X-rays toward a surface of a sample having an epitaxial layer formed thereon, and sensing the X-rays that are diffracted from the sample while resolving the sensed X-rays as a function of angle so as to generate a diffraction spectrum including a diffraction peak and fringes due to the epitaxial layer. A characteristic of the fringes is analyzed in order to measure a relaxation of the epitaxial layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.