Method for cleaning optical element of EUV light source device and optical element cleaning device
US8256441B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 24, 2008 |
| Grant date | Sep 4, 2012 |
| Priority date | — |
| Expiry date | Jun 28, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70033
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
A method for cleaning an optical element of an extreme ultraviolet light source device for removing, from the optical element in a chamber, scattered matter generated together with extreme ultraviolet light by plasma formed through laser beam excitation of a target in the chamber, the method which comprises: making the scattered matter generated by the plasma no larger than nanosize by using solid tin as the target and using a CO2 laser as an excitation source of the solid tin; and imparting, to the scattered matter no larger than the nanosize adhered to the optical element, an effect of overcoming the adherence of the scattered matter.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.