Patent · US Active

Electroless plating-liquid system

US8257781B1 · kind B1 · utility

3Cited by
22References
77Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 11, 2005
Grant dateSep 4, 2012
Priority date
Expiry dateAug 22, 2028

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/76841
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A main reservoir holds cool reactant liquid. A reaction vessel for treating a substrate is connected to the main reservoir by a feed conduit. A heater is configured to heat reactant liquid in the feed conduit before the liquid enters the reaction vessel. Preferably, the heater is a microwave heater. A recycle conduit connects the reaction vessel with the main reservoir. Preferably, a recycle cooler cools reactant liquid in the recycle conduit before the liquid returns to the main reservoir. Preferably, an accumulation vessel is integrated in the feed conduit for accumulating, heating, conditioning and monitoring reactant liquid before it enters the reaction vessel. Preferably, a recycle accumulator vessel is integrated in the recycle conduit to accommodate reactant liquid as it empties out of the reaction vessel.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.