Method of process optimization for dual tone development
US8257911B2 · kind B2 · utility
1Cited by
24References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 26, 2008 |
| Grant date | Sep 4, 2012 |
| Priority date | — |
| Expiry date | May 22, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/38
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for patterning a substrate is described. In particular, the invention relates to a method for double patterning a substrate using dual tone development. Further, the invention relates to optimizing a dual tone development process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.