Optical system for semiconductor lithography

US8269947B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Frank Melzer · Utzmemmingen, DE
• Yim-Bun Patrick Kwan · Aalen, DE
• Stefan Xalter · Oberkochen, DE
• Damian Fiolka · Oberkochen, DE

Key dates

• Filing date: Feb 17, 2009
• Grant date: Sep 18, 2012
• Expiry date: Dec 23, 2030

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70825
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

An optical system for semiconductor lithography including a plurality of optical components, as well as related components and methods, are disclosed. The apparatus can include an optical component that can be moved by a distance along a straight line within a time of between 5 ms and 500 ms. The straight line can have a polar and azimuth angle of between 0° and 90°, and a distance between the straight line and an optical axis of the apparatus being less than a cross-sectional dimension of a projection exposure beam bundle of the projection exposure apparatus. The apparatus can also include a guide unit configured to guide the optical component. The apparatus can further include a drive unit configured to drive the optical component via drive forces so that torques generated by inertial forces of the optical component and of optional components concomitantly moved with the optical component, and the torques generated by the drive forces, which act on the guide unit, compensate for one another to less than 10%.