Patent · US Active

Method for creating gray-scale features for dual tone development processes

US8283111B2 · kind B2 · utility

3Cited by

1References

11Claims

0Family size

Assignee

TOKYO ELECTRON LIMITED · JP

Inventors

Carlos A. Fonseca · Lagrangeville, US
Mark H. Somervell · Richardson, US
Steven Scheer · Austin, US

Key dates

Filing date	Dec 15, 2008
Grant date	Oct 9, 2012
Priority date	—
Expiry date	Apr 29, 2031

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/325
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A method of patterning a substrate using a dual-tone development process is described. The patterning method comprises forming a layer of radiation-sensitive material on a substrate, wherein the layer of radiation-sensitive material comprises a dual tone resist. Thereafter, the patterning method comprises performing one or more exposures of the layer of radiation-sensitive material to one or more patterns of radiation, wherein at least one of the one or more exposures comprises using a mask having a dual-tone mask pattern region configured for printing dual tone features and a half-tone mask pattern region configured for printing half-tone features. Furthermore, the half-tone mask pattern region is optimized for use with the dual tone resist.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.