Lithographic apparatus and device manufacturing method
US8289498B2 · kind B2 · utility
Assignee
Inventors
- Erik Roelof Loopstra
- Petrus Rutgerus Bartray
- Leon Martin Levasier
- Bernardus Antonius Johannes Luttikhuis
- Josephus Jacobus Smits
- Anthonie Aantjes
- Maurice Willem Jozef Etiënne Wijckmans
- Johannes Bernardus Ridder
- Andre Schreuder
- Dennis Jozef Maria Paulussen
- Peter Gerardus Jonkers
- Hugues Poincelin
- Fransiscus Theresia Noel Heusschen
Key dates
| Filing date | Jun 12, 2009 |
| Grant date | Oct 16, 2012 |
| Priority date | — |
| Expiry date | Feb 25, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70808
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic apparatus includes a projection system configured to project an image onto a substrate, a substrate table configured to support the substrate, a first chamber that at least partially surrounds the projection system, and a second chamber that at least partially surrounds the substrate table and a first frame. The apparatus includes a base frame configured to support the second chamber, and an intermediate frame coupled to the base frame. The intermediate frame is configured to separate the first chamber and the second chamber. The apparatus includes a support coupled to the first frame. The support is configured to support the first chamber through a coupled opening in the intermediate frame and the second chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.