Apparatus for efficient removal of halogen residues from etched substrates
US8293016B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 2, 2009 |
| Grant date | Oct 23, 2012 |
| Priority date | — |
| Expiry date | Mar 18, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24628
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An apparatus for removing volatile residues from a substrate is provided. In one embodiment, an apparatus for removing halogen-containing residues from a substrate includes a chamber suitable for operating maintaining a vacuum therein and a heat module positioned to heat a substrate disposed in the chamber. The apparatus for removing halogen-containing residues from a substrate also includes at least one of A) a temperature controlled pedestal having a projection extending radially therefrom suitable for supporting the temperature control pedestal on a ledge of the chamber body, the projection thermally isolating the base from the chamber body; B) a pair of substrate holders that include two support flanges extending radially inward from an inner edge of an arc-shaped body, each support flange having a substrate support step that includes a sloped landing; or C) a domed window.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.