Atomic force microscopy true shape measurement method
US8296860B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 16, 2009 |
| Grant date | Oct 23, 2012 |
| Priority date | — |
| Expiry date | Jun 18, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01Q30/06
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An atomic force microscopy (AFM) method includes a scanning probe that scans a surface of a structure to produce a first structure image. The structure is then rotated by 90° with respect to the scanning probe. The scanning probe scans the surface of the structure again to produce a second structure image. The first and second structure images are combined to produce best fit image of the surface area of the structure. The same method is used to produce the best fit image of a flat standard. The best fit image of the flat standard is subtracted from the best fit image of the structure to obtain a true topographical image in which Z direction run out error is substantially reduced or eliminated.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.