High throughput processing system for chemical treatment and thermal treatment and method of operating
US8303716B2 · kind B2 · utility
7Cited by
36References
20Claims
0Family size
Assignee
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Key dates
| Filing date | Jul 31, 2008 |
| Grant date | Nov 6, 2012 |
| Priority date | — |
| Expiry date | Aug 14, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/68742
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A high throughput processing system having a chemical treatment system and a thermal treatment system for processing a plurality of substrates is described. The chemical treatment system is configured to chemically treat a plurality of substrates in a dry, non-plasma environment. The thermal treatment system is configured to thermally treat a plurality of substrates chemically treated in the chemical treatment system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.