Patent · US Active

Method of manufacturing a projection objective and projection objective

US8310752B2 · kind B2 · utility

6Cited by

1References

5Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Heiko Feldmann · Aalen, DE
Toralf Gruner · Hennef (Sieg), DE
Alexander Epple · Aalen, DE

Key dates

Filing date	Mar 30, 2009
Grant date	Nov 13, 2012
Priority date	—
Expiry date	Oct 23, 2029

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70983
WIPO fieldOptics
WIPO sectorInstruments

Abstract

The disclosure relates to a method of manufacturing a projection objective, and a projection objective, such as a projection objective configured to be used in a microlithographic process. The method can include defining an initial design for the projection objective and optimizing the design using a merit function. The method can be used in the manufacturing of projection objectives which may be used in a microlithographic process of manufacturing miniaturized devices.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.