Mixing frequency at multiple feeding points
US8312839B2 · kind B2 · utility
154Cited by
6References
18Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Mar 24, 2010 |
| Grant date | Nov 20, 2012 |
| Priority date | — |
| Expiry date | Mar 30, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32165
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Embodiments disclosed herein generally relate to obtaining a substantially uniform plasma distribution within a large area processing chamber. For large area processing chambers that utilize RF voltages, standing waves can lead to deposition and/or etching non-uniformities. By applying RF voltage in at least two separate locations at two separate, but close frequencies with or without phase modulation, the wave interference pattern moves across the electrode. By moving the standing wave across the electrode, the plasma generated in the chamber can, over time, be substantially uniform.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.