Step and repeat imprint lithography process
US8318066B2 · kind B2 · utility
4Cited by
2References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 16, 2011 |
| Grant date | Nov 27, 2012 |
| Priority date | — |
| Expiry date | May 16, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0002
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
The present invention is directed to methods for patterning a substrate by imprint lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate. A template is brought into contact with the liquid and the liquid is cured. The cured liquid includes an imprint of any patterns formed in the template. In one embodiment, the imprint process is designed to imprint only a portion of the substrate. The remainder of the substrate is imprinted by moving the template to a different portion of the template and repeating the imprint lithography process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.