Patent · US Active

Micro-electromechanical system devices

US8318581B2 · kind B2 · utility

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10References

10Claims

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Assignee

Infineon Technologies AG · DE

Inventors

Karl-Heinz Mueller · Grand Rapids, US
Bernhard Winkler · Birkenfeld, DE
Robert Gruenberger · Nandlstadt, DE

Key dates

Filing date	Nov 18, 2011
Grant date	Nov 27, 2012
Priority date	—
Expiry date	Nov 18, 2031

Classification

Technology area (CPC B)Performing Operations; Transporting
CPC primaryB81C2203/0742
WIPO fieldMicro-structural and nano-technology
WIPO sectorChemistry

Abstract

Micro-electromechanical system (MEMS) devices and methods of manufacture thereof are disclosed. In one embodiment, a MEMS device includes a semiconductive layer disposed over a substrate. A trench is disposed in the semiconductive layer, the trench with a first sidewall and an opposite second sidewall. A first insulating material layer is disposed over an upper portion of the first sidewall, and a conductive material disposed within the trench. An air gap is disposed between the conductive material and the semiconductive layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.