SRAM memory cell with double gate transistors provided means to improve the write margin
US8320198B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 16, 2009 |
| Grant date | Nov 27, 2012 |
| Priority date | — |
| Expiry date | Aug 6, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11C11/412
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A random access memory cell including: two double-gate access transistors respectively arranged between a first bit line and a first storage node and between a second bit line and a second storage node, a word line, a first double-gate load transistor and a second double-gate load transistor, a first double-gate driver transistor and a second double-gate driver transistor, a mechanism to apply a given potential to at least one electrode of each of the load or driver transistors, and a mechanism to cause the given potential to vary.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.