Resist protective coating material and patterning process
US8323872B2 · kind B2 · utility
15Cited by
2References
7Claims
0Family size
Assignee
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Key dates
| Filing date | Jun 13, 2006 |
| Grant date | Dec 4, 2012 |
| Priority date | — |
| Expiry date | Aug 21, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0046
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A resist protective coating material is provided comprising a polymer having a partial structure of formula (1) wherein R0 is H, F, alkyl or alkylene, and R1 is fluorinated alkyl or alkylene. In a pattern-forming process, the material forms on a resist film a protective coating which is water-insoluble, dissolvable in alkaline developer and immiscible with the resist film, allowing for effective implementation of immersion lithography. During alkali development, development of the resist film and removal of the protective coating can be simultaneously achieved.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.