Method and system for correcting image changes
US8325323B2 · kind B2 · utility
1Cited by
7References
52Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 29, 2009 |
| Grant date | Dec 4, 2012 |
| Priority date | — |
| Expiry date | Apr 24, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70258
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The disclosure relates to a method for compensating image errors, generated by intensity distributions in optical systems, such as in projection lens arrays of microlithography systems, and to respective optical systems, such as projection lens arrays of microlithography systems.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.