Chamber isolation valve RF grounding
US8327878B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 11, 2008 |
| Grant date | Dec 11, 2012 |
| Priority date | — |
| Expiry date | Oct 21, 2030 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/8242
- WIPO fieldMechanical elements
- WIPO sectorMechanical engineering
Abstract
Methods and apparatus for grounding a chamber isolation valve for a processing system are provided. In one embodiment, a grounded chamber isolation valve for a plasma processing system is described. The chamber isolation valve includes a door and a bracing member movably attached to and opposing the door, and at least one electrically conductive member in electrical communication with the door, the at least one electrically conductive member comprising one or more reaction bumpers disposed on the bracing member that are adapted to contact at least one grounded component of the plasma processing system when the door is in the closed position.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.