Lithographic apparatus and device manufacturing method
US8330936B2 · kind B2 · utility
3Cited by
5References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 20, 2006 |
| Grant date | Dec 11, 2012 |
| Priority date | — |
| Expiry date | Jul 12, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70425
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A path which a substrate should take under the projection system during immersion lithography imaging of a plurality of dies on the top surface of the substrate is disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.