Developing apparatus, developing method and storage medium
US8333522B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 11, 2011 |
| Grant date | Dec 18, 2012 |
| Priority date | — |
| Expiry date | Jun 23, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/3021
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
There is provided a developing apparatus capable of achieving high throughput. The developing apparatus includes an airtightly sealed processing vessel that forms a processing atmosphere therein; an atmosphere gas supply unit that supplies an atmosphere gas containing mist of a developing solution into the processing vessel in order to form a liquid film of the developing solution on a surface of a substrate loaded into the processing vessel; and a drying unit that dries the substrate in order to stop a developing process by the liquid film. A reaction between a resist and the developing solution can be stopped. Therefore, a developing process can be performed in parallel with a cleaning process performed by a cleaning module and high throughput is achieved.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.