High-purity aqueous copper sulfonate solution and method of producing same
US8333834B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 9, 2011 |
| Grant date | Dec 18, 2012 |
| Priority date | — |
| Expiry date | Feb 9, 2031 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC01P2006/80
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
An object of the present invention is to provide a high-purity aqueous copper sulfonate solution and a simplified method of producing this solution.The aqueous copper sulfonate solution of the present invention is characterized in that the copper concentration therein is at least 90 g/L, the content of metal impurities is less than 10 mg/L as metal for each metal impurity, the content of chlorine is less than 10 mg/L, and the sulfonic acid is a sulfonic acid represented by the following general formulaR—(SO3H)n (in the formula, R represents a lower alkyl group, lower alkylidene group, lower alkylene group, or hydroxyalkyl group and n represents 1 or 2).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.