Multi-station plasma reactor with multiple plasma regions
US8336488B2 · kind B2 · utility
8Cited by
13References
28Claims
0Family size
Assignee
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Key dates
| Filing date | Dec 20, 2007 |
| Grant date | Dec 25, 2012 |
| Priority date | — |
| Expiry date | Jun 7, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32862
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma chamber is constructed to have a chamber body defining therein a plurality of process stations. A plurality of rotating substrate holders are each situated in one of the process stations and a plurality of in-situ plasma generation regions are each provided above one of the substrate holders. A plurality of quasi-remote plasma generation regions are each provided above a corresponding in-situ plasma generation region and being in gaseous communication with the corresponding in-situ plasma generation region. An RF energy source is coupled to each of the quasi-remote plasma generation regions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.