Plasma processing apparatus
US8336490B2 · kind B2 · utility
4Cited by
8References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 28, 2011 |
| Grant date | Dec 25, 2012 |
| Priority date | — |
| Expiry date | Dec 28, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/321
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A vertical plasma processing apparatus for performing a plasma process on a plurality of target objects together at a time includes an activation mechanism configured to turn a process gas into plasma. The activation mechanism includes a vertically elongated plasma generation box attached to a process container at a position corresponding to a process field to form a plasma generation area airtightly communicating with the process field, an ICP electrode provided to the plasma generation box, and an RF power supply connected to the electrode.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.