Lithographic apparatus and device manufacturing method
US8339574B2 · kind B2 · utility
2Cited by
7References
7Claims
0Family size
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Key dates
| Filing date | Aug 15, 2008 |
| Grant date | Dec 25, 2012 |
| Priority date | — |
| Expiry date | Jan 19, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70566
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern, a substrate table configured to hold a substrate and a projection system configured to project the beam as patterned onto a target portion of the substrate. The lithographic apparatus further includes a polarization modifier disposed in a path of the beam. The polarization modifier comprises a material having a linear polarization.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.