Method, program product and apparatus for performing a model based coloring process for geometry decomposition for use in a multiple exposure process
US8340394B2 · kind B2 · utility
2Cited by
4References
20Claims
0Family size
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Key dates
| Filing date | Jul 24, 2009 |
| Grant date | Dec 25, 2012 |
| Priority date | — |
| Expiry date | Jan 15, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70466
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of decomposing a target pattern having features to be imaged on a substrate so as to allow said features to be imaged in a multi-exposure process. The method includes
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.