Electrical mask inspection
US8343781B2 · kind B2 · utility
5Cited by
16References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 21, 2010 |
| Grant date | Jan 1, 2013 |
| Priority date | — |
| Expiry date | Jan 14, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An apparatus and method for electrical mask inspection is disclosed. A scan chain is formed amongst two metal layers and a via layer. One of the three layers is a functional layer under test, and the other two layers are test layers. A resistance measurement of the scan chain is used to determine if a potential defect exists within one of the vias or metal segments comprising the scan chain.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.